Nanoimprint lithography can be defined as the use of a mold to define nanoscale deformation of a resist, which is then cured either by heat or UV application. Silicon molds are mainly used in the thermal nanoimprint method. Patterns are drawn with an electron beam on a silicon substrate that has been coated with photosensitive resin. Dry etching is then used to make the patterns deeper. The manufacturing process, same as that of Quartz mold
